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Proceedings Paper

Effects of cooling rates on the crystal orientation of sputtered Pb-Ti-O thin films
Author(s): Ryuta Ai; Hiroaki Ito; Goh Asayama; Yoko Ichikawa; Kiyotaka Wasa
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Paper Abstract

Thin films of Pb-Ti-O families, PbTiO3 (PT) and (Pb,La)TiO3 (PLT), were grown at 600 degree(s)C on (100)MgO substrates by rf- magnetron sputtering at various cooling rates (3 degree(s)C/min to 33 degree(s)C/min). It is found that c-axis orientation of the PT thin films was enhanced by the increase of the cooling rates and the a- axis orientation of PT thin films was enhanced by the decrease of the cooling rates. While, c-axis orientation of the PLT thin films was achieved independent of the cooling rates. The growth mechanism of the a-axis orientation of PT thin films will be governed by an epitaxial growth and the c-axis orientation will be caused by the preferred orientation. The cooling rates are essential for the control of the orientation of PT thin films on (100)MgO substrates.

Paper Details

Date Published: 6 September 2000
PDF: 8 pages
Proc. SPIE 4058, Superconducting and Related Oxides: Physics and Nanoengineering IV, (6 September 2000); doi: 10.1117/12.397861
Show Author Affiliations
Ryuta Ai, Yokohama City Univ. (Japan)
Hiroaki Ito, Yokohama City Univ. (Japan)
Goh Asayama, Yokohama City Univ. (Japan)
Yoko Ichikawa, Reasearch Institute of Innovative Technology for the Earth (Japan)
Kiyotaka Wasa, Yokohama City Univ. (Japan)


Published in SPIE Proceedings Vol. 4058:
Superconducting and Related Oxides: Physics and Nanoengineering IV
Davor Pavuna; Ivan Bozovic, Editor(s)

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