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Proceedings Paper

Benchmarking of advanced CD-SEMs against a new unified specification for sub-0.18-um lithography
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Paper Abstract

The AMAG comprised of representatives from International SEMATECH consortium member companies and the National Institute of Standards and Technology have joined to develop a new unified specification for an advanced scanning electron microscope critical dimension measurement instrument (CD-SEM). This paper describes the result of an effort to benchmark six CD-SEM instruments according to this specification.

Paper Details

Date Published: 18 August 2000
PDF: 16 pages
Proc. SPIE 4181, Challenges in Process Integration and Device Technology, (18 August 2000); doi: 10.1117/12.395750
Show Author Affiliations
Alain G. Deleporte, International SEMATECH (France)
John A. Allgair, Motorola (United States)
Charles N. Archie, IBM Corp. (United States)
G. William Banke Jr., IBM Corp. (United States)
Michael T. Postek Jr., National Institute of Standards and Technology (United States)
Jerry E. Schlesinger, Texas Instruments Inc. (United States)
Andras E. Vladar, National Institute of Standards and Technology (United States)
Arnold W. Yanof, Motorola (United States)


Published in SPIE Proceedings Vol. 4181:
Challenges in Process Integration and Device Technology
David Burnett; Shin'ichiro Kimura; Bhanwar Singh, Editor(s)

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