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Proceedings Paper

Pattern placement errors: application of in-situ interferometer-determined Zernike coefficients in determining printed image deviations
Author(s): William R. Roberts; Christopher J. Gould; Adlai H. Smith; Ken Rebitz
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Paper Abstract

Several ideas have recently been presented which attempt to measure and predict lens aberrations for new low k1 imaging systems. Abbreviated sets of Zernike coefficients have been produced and used to predict Across Chip Linewidth Variation. Empirical use of the wavefront aberrations can now be used in commercially available lithography simulators to predict pattern distortion and placement errors. Measurement and Determination of Zernike coefficients has been a significant effort of many. However the use of this data has generally been limited to matching lenses or picking best fit lense pairs. We will use wavefront aberration data collected using the Litel InspecStep in-situ Interferometer as input data for Prolith/3D to model and predict pattern placement errors and intrafield overlay variation. Experiment data will be collected and compared to the simulated predictions.

Paper Details

Date Published: 18 August 2000
PDF: 8 pages
Proc. SPIE 4181, Challenges in Process Integration and Device Technology, (18 August 2000); doi: 10.1117/12.395748
Show Author Affiliations
William R. Roberts, White Oak Semiconductor/Infineon Technologies AG (United States)
Christopher J. Gould, White Oak Semiconductor/Infineon Technologies AG (United States)
Adlai H. Smith, Litel Instruments (United States)
Ken Rebitz, Litel Instruments (United States)


Published in SPIE Proceedings Vol. 4181:
Challenges in Process Integration and Device Technology
David Burnett; Shin'ichiro Kimura; Bhanwar Singh, Editor(s)

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