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Proceedings Paper

Micro nano technology visualization (MNTV) of micromachined MEMS polysilicon structures
Author(s): Russell A. Lawton; Gisela Lin; Joanne Wellman; Leslie M. Phinney; Jose Uribe; Edward Griffith; Ingrid De Wolf; Eric Lawrence
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Paper Abstract

Micro-Nano Technology Visualization (MNTV) is critical to studies in MEMS reliability. The ability to see and characterize the microstructures and interfaces with high resolution at the microscale and nanoscale is invaluable. In this paper we present the motivation, paradigm and examples of visualization techniques applied to several aspects of surface micromachined polysilicon structures. High resolution cross-section imaging, using both a FIB/SEM and FIB/STEM, is used to acquire information on profile differences between fabrication facilities and grain size and orientation. The AFM is used to compare surface roughness on both sides (top and bottom surfaces) of thin film polysilicon after release etching. The data gathered will be extremely useful feedback for fabrication facilities in terms of process characterization and quality assurance. The data will also be useful for MEMS CAD tools where device and process models must be validated.

Paper Details

Date Published: 10 August 2000
PDF: 10 pages
Proc. SPIE 4180, MEMS Reliability for Critical Applications, (10 August 2000); doi: 10.1117/12.395698
Show Author Affiliations
Russell A. Lawton, Jet Propulsion Lab. (United States)
Gisela Lin, Jet Propulsion Lab. (United States)
Joanne Wellman, Jet Propulsion Lab. (United States)
Leslie M. Phinney, Univ. of Illinois/Urbana-Champaign (United States)
Jose Uribe, Jet Propulsion Lab. (United States)
Edward Griffith, FEI Co. (United States)
Ingrid De Wolf, IMEC (Belgium)
Eric Lawrence, Polytec PI, Inc. (United States)

Published in SPIE Proceedings Vol. 4180:
MEMS Reliability for Critical Applications
Russell A. Lawton, Editor(s)

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