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Proceedings Paper

Fabrication technologies for micro-optical elements with arbitrary surfaces
Author(s): Andreas Schilling; Philippe Nussbaum; Irene Philipoussis; Hans Peter Herzig; Laurent Stauffer; Markus Rossi; Ernst-Bernhard Kley
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Paper Abstract

We present a comparison of three different technologies for the fabrication of micro-optical elements with arbitrary surfaces. We used direct laser writing in photoresist, binary mask lithography in combination with reactive ion etching in fused silica, and High-Energy- Beam-Sensitive (HEBS) glass graytone lithography in photoresist. We analyzed the efficiencies and the deflection angles of different elements in order to quantify the performance of the different technologies. We found that higher effencies can be achieved with refractive type elements, while precise deflection angles can be obtained more easily with diffractive elements.

Paper Details

Date Published: 18 August 2000
PDF: 8 pages
Proc. SPIE 4179, Micromachining Technology for Micro-Optics, (18 August 2000); doi: 10.1117/12.395692
Show Author Affiliations
Andreas Schilling, Univ. of Neuchatel (Switzerland)
Philippe Nussbaum, Univ. of Neuchatel (Switzerland)
Irene Philipoussis, Univ. of Neuchatel (Switzerland)
Hans Peter Herzig, Univ. of Neuchatel (Switzerland)
Laurent Stauffer, Leica Geosystems AG (Switzerland)
Markus Rossi, Ctr. Suisse d'Electronique et de Microtechnique SA (Switzerland)
Ernst-Bernhard Kley, Friedrich-Schiller-Univ. Jena (Germany)


Published in SPIE Proceedings Vol. 4179:
Micromachining Technology for Micro-Optics
Sing H. Lee; Eric G. Johnson, Editor(s)

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