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Proceedings Paper

Miniaturized objective lens for a photoelectron emission microscope
Author(s): Laurence Singleton; Yannick Ansel; Ralf Baron; Gebhard H.L. Marx; Matthias Nienhaus; Felix Schmitz; Gerd Schoenhense; Andreas Schmidt
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Paper Abstract

Photoemission electron microscopy (PEEM) has turned out to be one of the most promising methods for surface analysis in the recent years. It is a full field imaging technique based on the emission of secondary electrons by far ultraviolet light or X-rays. The emission intensity of secondary electrons is critically dependent upon the acceptance angle of the incident radiation. However, the size of the microscope restricts this angle substantially. Miniaturizing the objective lens of the microscope reduces the restriction of the acceptance angle and improves the performance of the PEEM considerably. We report on the fabrication of a miniaturized objective lens containing the extraction electrode, the electron column, the contrast aperture and the electron optical correction system for a PEEM. The extraction electrode as well as the electron column have been manufactured using precision milling techniques and electron discharge micromachining. For the fabrication of the correction system (stigmator / bending unit), a process combining aligned photolithography into a thick SU-8 resist and electroforming has been used. All electrodes were made in gold with a height of 150 (mu) m. After attaching a FOTURAN substrate to the electrode and etching under the electrodes, free standing apertures in an octupole and quadruple arrangement were obtained. The outer diameter of the electrodes is 5 mm and the inner diameter is 1 mm, respectively. Each electrode is connect individually to the external power supply which controls their operation. The overall size of the miniaturized objective lens is 23 mm, which has reduced the size of the lens by one order of magnitude when compared to commercially available instruments.

Paper Details

Date Published: 18 August 2000
PDF: 12 pages
Proc. SPIE 4179, Micromachining Technology for Micro-Optics, (18 August 2000); doi: 10.1117/12.395685
Show Author Affiliations
Laurence Singleton, Institut fuer Mikrotechnik Mainz GmbH (Germany)
Yannick Ansel, Institut fuer Mikrotechnik Mainz GmbH (Germany)
Ralf Baron, Institut fuer Mikrotechnik Mainz GmbH (Germany)
Gebhard H.L. Marx, Johannes-Gutenberg-Univ.-Mainz (Germany)
Matthias Nienhaus, Institut fuer Mikrotechnik Mainz GmbH (Germany)
Felix Schmitz, Institut fuer Mikrotechnik Mainz GmbH (Germany)
Gerd Schoenhense, Johannes-Gutenberg-Univ.-Mainz (Germany)
Andreas Schmidt, Institut fuer Mikrotechnik Mainz GmbH (Germany)

Published in SPIE Proceedings Vol. 4179:
Micromachining Technology for Micro-Optics
Sing H. Lee; Eric G. Johnson, Editor(s)

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