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Proceedings Paper

Fabrication of a micromachined optical modulator using the CMOS process
Author(s): Hunglin Chen; Kaihsiang Yen; Huiwen Huang; Jinhung Chio; Chingliang Dai; Chienliu Chang; Peizen Chang
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Paper Abstract

This investigation presenst a micromachined optical modulator with electrostatic actuation fabricated by the conventional CMOS process. The modulator is operated by interaction of fixed part, stationary gratings, and movable part, sliding gratings. The period of the gratings varies with the slide of the movable part, thereby allowing different diffraction patterns of the reflected light. In addition, 100% modulation in the first order can serve as an optical switch. All procedures following the CMOS process merely require a simple post-process. With maskless etching, the micromachined optical modulator is developed to obtain a high-aspect-ratio structure and high efficiency of modulation. Compare to the commercially available acoustic ones, the micromachined optical modulator proposed herein is smaller and weigh less.

Paper Details

Date Published: 11 July 2000
PDF: 7 pages
Proc. SPIE 4078, Optoelectronic Materials and Devices II, (11 July 2000); doi: 10.1117/12.392196
Show Author Affiliations
Hunglin Chen, Industrial Technology Research Institute (Taiwan)
Kaihsiang Yen, Industrial Technology Research Institute (Taiwan)
Huiwen Huang, Industrial Technology Research Institute (Taiwan)
Jinhung Chio, Industrial Technology Research Institute (Taiwan)
Chingliang Dai, Oriental Institute of Technology (Taiwan)
Chienliu Chang, National Taiwan Univ. (Taiwan)
Peizen Chang, National Taiwan Univ. (Taiwan)


Published in SPIE Proceedings Vol. 4078:
Optoelectronic Materials and Devices II
Yan-Kuin Su; Pallab Bhattacharya, Editor(s)

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