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Proceedings Paper

Optical and transport properties of MOCVD-grown InSb thin films
Author(s): Tzuen Rong Yang; Goutam Kuri; MiRa Kim; Zhe Chuan Feng; Soo-Jin Chua
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Paper Abstract

In this work we present optical investigations of metalorganic chemical vapor deposition (MOCVD) grown InSb thin films on GaAs(100) substrates and MeV ion implanted InSb(111) bulk crystals. Far-infrared (FIR) reflectance spectroscopy has been used to study the lattice vibration behavior of all the samples. For the MOCVD films the effects of III-V source ratios on the films crystalline quality may have been reported. Two additional weak modes in the wavenumber regions of 210-240 cm-1 are observed and they appeared more prominent at low temperatures. Interference fringe effects modify the FIR reflectance band of the GaAs substrate. They are related to the uniformity of film thickness and crystalline perfection. The relationship between these interference features and film quality as well as thickness uniformity was obtained from the measured spectra. The carrier concentration, mobility, effective mass as well as the dielectric constant of these films have been determined. For the bulk InSb crystals, high energy C+ ions have been implanted and MeV energies and, the optical as well as transport properties of the implanted layers have been presented and discussed.

Paper Details

Date Published: 11 July 2000
PDF: 8 pages
Proc. SPIE 4078, Optoelectronic Materials and Devices II, (11 July 2000); doi: 10.1117/12.392105
Show Author Affiliations
Tzuen Rong Yang, National Taiwan Normal Univ. (Taiwan)
Goutam Kuri, National Taiwan Normal Univ. (Germany)
MiRa Kim, National Taiwan Normal Univ. (Taiwan)
Zhe Chuan Feng, Institute of Materials Research and Engineering (Singapore)
Soo-Jin Chua, Institute of Materials Research and Engineering (Singapore)


Published in SPIE Proceedings Vol. 4078:
Optoelectronic Materials and Devices II
Yan-Kuin Su; Pallab Bhattacharya, Editor(s)

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