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Proceedings Paper

Pellicle for F2 laser lithography
Author(s): Toru Shirasaki; Meguru Kashida
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Paper Abstract

The two possible 157nm-pellicle membrane materials are discussed. Currently polymers have considerable absorption at 157nm. The F2 laser durability evaluation was carried out for the polymer with the least absorption. The polymer membrane suffered severe damage after short irradiation. What is the most important for the polymer membrane is to reduce the absorption at 157nm in order to increase the transmission and to improve the durability. Modified fused silica is the material for mask substrate for F2 laser lithography. This fused silica shows good laser durability, but stringent tolerances are required when the fused silica plate is applied for pellicle membrane. Thickness uniformity and bending of plate are discussed.

Paper Details

Date Published: 19 July 2000
PDF: 8 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392093
Show Author Affiliations
Toru Shirasaki, Shin-Etsu Chemical Co., Ltd. (Japan)
Meguru Kashida, Shin-Etsu Chemical Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

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