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Proceedings Paper

New modified silica glass for 157-nm lithography
Author(s): Yoshiaki Ikuta; Shinya Kikugawa; T. Kawahara; H. Mishiro; Kaname Okada; Katsuhiro Ochiai; Keigo Hino; T. Nakajima; M. Kawata; Shuhei Yoshizawa
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Paper Abstract

Projection photolithography at 157 nm is now under research as a possible extension of current 248 and planned 193 nm technologies. We have succeeded in the development of the modified fused silica glass 'AQF' for 157 nm lithography. In this paper, we present the performance of the newest material; AQF/Ver.2.1. Transmission and its uniformity at 157 nm is better than 78 +/- 1.5 percent, and birefringence is within 2 nm. We also have developed hard pellicle with 300 micrometers thickness. Its transmission is over 92 percent when AR films are coated on both surfaces. This hard pellicle also has a very good durability to F2 laser.

Paper Details

Date Published: 19 July 2000
PDF: 7 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392092
Show Author Affiliations
Yoshiaki Ikuta, Asahi Glass Co., Ltd. (Japan)
Shinya Kikugawa, Asahi Glass Co., Ltd. (Japan)
T. Kawahara, Asahi Glass Co., Ltd. (Japan)
H. Mishiro, Asahi Glass Co., Ltd. (Japan)
Kaname Okada, Asahi Glass Co., Ltd. (Japan)
Katsuhiro Ochiai, Asahi Glass Co., Ltd. (Japan)
Keigo Hino, Asahi Glass Co., Ltd. (Japan)
T. Nakajima, Asahi Glass Co., Ltd. (Japan)
M. Kawata, Asahi Glass Co., Ltd. (Japan)
Shuhei Yoshizawa, Asahi Glass Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

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