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Proceedings Paper

Cluster tool solution for fabrication and qualification of advanced photomasks
Author(s): Thomas Schaetz; Hans Hartmann; Kai Peter; Frederic P. Lalanne; Olivier Maurin; Emanuele Baracchi; Corinne Miramond; Hans-Juergen Brueck; Gerd Scheuring; Thomas Engel; Yair Eran; Karl Sommer
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Paper Abstract

The reduction of wavelength in optical lithography, phase shift technology and optical proximity correction (OPC), requires a rapid increase in cost effective qualification of photomasks. The knowledge about CD variation, loss of pattern fidelity especially for OPC pattern and mask defects concerning the impact on wafer level is becoming a key issue for mask quality assessment. As part of the European Community supported ESPRIT projection 'Q-CAP', a new cluster concept has been developed, which allows the combination of hardware tools as well as software tools via network communication. It is designed to be open for any tool manufacturer and mask hose. The bi-directional network access allows the exchange of all relevant mask data including grayscale images, measurement results, lithography parameters, defect coordinates, layout data, process data etc. and its storage to a SQL database. The system uses SEMI format descriptions as well as standard network hardware and software components for the client server communication. Each tool is used mainly to perform its specific application without using expensive time to perform optional analysis, but the availability of the database allows each component to share the full data ste gathered by all components. Therefore, the cluster can be considered as one single virtual tool. The paper shows the advantage of the cluster approach, the benefits of the tools linked together already, and a vision of a mask house in the near future.

Paper Details

Date Published: 19 July 2000
PDF: 9 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392088
Show Author Affiliations
Thomas Schaetz, Infineon Technologies AG (Germany)
Hans Hartmann, aiss GmbH (Germany)
Kai Peter, aiss GmbH (Germany)
Frederic P. Lalanne, CNET (France)
Olivier Maurin, DuPont Photomasks S.A. (France)
Emanuele Baracchi, STMicroelectronics (Italy)
Corinne Miramond, STMicroelectronics (France)
Hans-Juergen Brueck, MueTec GmbH (Germany)
Gerd Scheuring, MueTec GmbH (Germany)
Thomas Engel, Carl Zeiss Jena GmbH (Germany)
Yair Eran, Applied Materials Israel Ltd. (Israel)
Karl Sommer, Karl Sommer Consulting (Germany)

Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

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