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Proceedings Paper

Newly developed mask inspection system with DUV laser illumination
Author(s): Katsuki Oohashi; Hiromu Inoue; Takehiko Nomura; Akira Ono; Mitsuo Tabata; Hitoshi Suzuki
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Paper Abstract

A new mask inspection system for 150nm and 130nm semiconductor devices which utilizes a DUV laser of 257nm wavelength for an inspection illumination has been developed. A newly developed optical phase shift disk cancels the speckle nose caused by the high coherency of a laser. The phase shift disk has micro pits with different depth disposed randomly over the entire plate surface. The speckle pattern changes randomly by rotating the plate, and averaging pattern image by TDI sensor cancels the speckle noise of the laser illumination. Using this method, inspection of masks was realized at DUV wavelength.

Paper Details

Date Published: 19 July 2000
PDF: 10 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392086
Show Author Affiliations
Katsuki Oohashi, Toshiba Corp. (Japan)
Hiromu Inoue, Toshiba Corp. (Japan)
Takehiko Nomura, Toshiba Corp. (Japan)
Akira Ono, Topcon Corp. (Japan)
Mitsuo Tabata, Toshiba Corp. (Japan)
Hitoshi Suzuki, Topcon Corp. (Japan)

Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

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