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Proceedings Paper

Development of a fast linewidth correction system
Author(s): Ryuji Takenouchi; Isao Ashida; Hiroichi Kawahira
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Paper Abstract

A fast line width correction system which has significantly small increase in the processing time by adding new correction rules for improving correction accuracy has been developed. This system corrects only patterns which have edges with 45 X n degree angles, thereby, these patterns are operated at high speed by the scan line method known as a fast algorithm for geometrical operations. Also, angled patterns can be further simply corrected than that with the conventional system. The system is operated on a clustering system at high performance using multiple machines such as middle class PC-UNIX. As a result, total elapsed processing time for the gate layer with around 150 M gates 0.18 micrometers logic with embedded DRAM was improved by a factor of 9.3 with this system in comparison to that with a conventional system. In this paper, details of the system design and application for actual 0.18 micrometers devices will be further discussed.

Paper Details

Date Published: 19 July 2000
PDF: 9 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392081
Show Author Affiliations
Ryuji Takenouchi, Sony Corp. (Japan)
Isao Ashida, Sony Corp. (Japan)
Hiroichi Kawahira, Sony Corp. (Japan)


Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

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