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Proceedings Paper

Results from a new laser pattern generator for 180-nm photomasks
Author(s): Tomas Vikholm; Lars Kjellberg; Per Askebjer; Steven Haddleton; Johan Larsson; Mans Bjuggren
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Paper Abstract

180 nm photomasks require resolution and CD control that is normally not available from laser based systems. This paper describes the new Micronic Omega6000 laser pattern generator targeted at 180 nm as well as results from the system. The Omega6000 uses an architecture based on acousto-optics that improves the CD control. A 0.86 NA lens results in a high resolution. A dose modulation method provides a 5 nm address grid using single pass writing. The system incorporates a multi-processor data path designed to handle complex 180 nm patterns without reducing the writing speed. The data path is scalable which allows expansion with increasing data complexity.

Paper Details

Date Published: 19 July 2000
PDF: 7 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392080
Show Author Affiliations
Tomas Vikholm, Micronic Laser Systems AB (Sweden)
Lars Kjellberg, Micronic Laser Systems AB (Sweden)
Per Askebjer, Micronic Laser Systems AB (Sweden)
Steven Haddleton, Micronic Laser Systems AB (Sweden)
Johan Larsson, Micronic Laser Systems AB (United States)
Mans Bjuggren, Micronic Laser Systems AB (Sweden)

Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

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