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Proceedings Paper

ALTA 3700: extending the application space of the ALTA 3500 laser reticle writer
Author(s): Cris G. Morgante; Henry Chris Hamaker
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Paper Abstract

Critical dimension (CD) uniformity, stripe butting, and composite overlay results from incremental improvements in critical subsystems on the ALTA 3500 have been previously reported. Integrating those optimized subsystems with another major subsystem improvement in the recently introduced ALTA 3700 system has allowed laser reticle writers to address the needs of maskmakers in the 180 nm and 150 nm technology nodes. This paper presents the results of a redesigned acousto-optic modulator that addresses thermal- induced beam intensity variations, which have the potential to induce CD uniformity errors. In addition, studies on print-quality performance and throughput on masks that are representative of a true product show that the integrated performance of the ALTA 3700 system extends the performance of ALTA 3500 system.

Paper Details

Date Published: 19 July 2000
PDF: 11 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392079
Show Author Affiliations
Cris G. Morgante, Etec Systems, Inc. (United States)
Henry Chris Hamaker, Etec Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

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