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Proceedings Paper

Spray developer for ZEP 7000
Author(s): Atsushi Kawata; Kakuei Ozawa; Nobunori Abe; Kazuhide Yamashiro; Takeshi Aizawa
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Paper Abstract

ZEP7000 has been successfully used as EB resist for high-end photomask manufacturing where high dry etching resistance, high sensitivity and high resolution are required. ZED-500 is the common developer use din spray development process and ZED-750 for puddle development process. These developers are designed to suite particularly for dry etching pattern profile. In this paper, we introduce a new developer, ZED- 450 which performs equivalent to ZED-500 while requiring either lower dosage or shorter development time in spray development process.

Paper Details

Date Published: 19 July 2000
PDF: 9 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392062
Show Author Affiliations
Atsushi Kawata, Nippon Zeon Co., Ltd. (Japan)
Kakuei Ozawa, Nippon Zeon Co., Ltd. (Japan)
Nobunori Abe, Nippon Zeon Co., Ltd. (Japan)
Kazuhide Yamashiro, HOYA Corp. (Japan)
Takeshi Aizawa, HOYA Corp. (Japan)

Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

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