Share Email Print
cover

Proceedings Paper

Fogging effect compensation technique for photomask making
Author(s): Yuji Nozaki; Toshiyuki Tanaka; Katsuhiro Takushima; Seki Suzuki; Akihiro Endo; Kohei Sogo; Yasuki Kimura
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

We investigated a new method for decrease of CD disparity due to fogging effect at photomask making, utilizing side- wall-angle-dependence of CD loss through descum process. We demonstrated this method could be valid for less than half- micron. This method can be effective on condition of anisotropic descum, no 'foot' at post-descum, and just- or under-development. Using this method, we obtained CD uniformity of 18.6 over fogging and non-fogging field, including process error.

Paper Details

Date Published: 19 July 2000
PDF: 12 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392057
Show Author Affiliations
Yuji Nozaki, Oki Electric Industry Co., Ltd. (Japan)
Toshiyuki Tanaka, Oki Electric Industry Co., Ltd. (Japan)
Katsuhiro Takushima, Oki Electric Industry Co., Ltd. (Japan)
Seki Suzuki, Oki Electric Industry Co., Ltd. (Japan)
Akihiro Endo, Oki Electric Industry Co., Ltd. (Japan)
Kohei Sogo, Oki Electric Industry Co., Ltd. (Japan)
Yasuki Kimura, Oki Electric Industry Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

© SPIE. Terms of Use
Back to Top