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Proceedings Paper

Graphite membrane applied for high-aspect-ratio microstructure fabrication
Author(s): Hsiharng Yang; Min-Chieh Chou; Horng-Jey Wang; Chengtang Pan; Jiang Long Lin
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Paper Abstract

X-ray mask is the most important component in the x-ray micromachining. Absorber patterns have to form onto a working mask, then patterns can be transferred into the substrate. Graphite membrane has characters of low atomic number, electrical conductor, and rigid body suitable for a support diaphragm in a working mask.

Paper Details

Date Published: 19 July 2000
PDF: 7 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392053
Show Author Affiliations
Hsiharng Yang, Fushin Institute of Technology (Taiwan)
Min-Chieh Chou, Industrial Technology Research Institute and National Tsing Hua Univ. (Taiwan)
Horng-Jey Wang, Industrial Technology Research Institute (Taiwan)
Chengtang Pan, Industrial Technology Research Institute (Taiwan)
Jiang Long Lin, Fushin Institute of Technology (Taiwan)


Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

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