Share Email Print
cover

Proceedings Paper

Surface preparation of EUVL mask substrate for multilayer coating by supersonic hydrocleaning technique
Author(s): Naoya Hirano; Hiromasa Hoko; Eiichi Hoshino; Taro Ogawa; Akira Chiba; Hiromasa Yamanashi; Masashi Takahashi; Shinji Okazaki
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Extreme UV lithography (EUVL) is a promising process for patterning devices for the 70-nm technology node and below. In order to fabricate low-defect EUVL-mask blanks, two kinds of cleaning techniques have to be developed. One is for cleaning a substrate before deposition of the Mo/Si multi- layer, since particles on the substrate can induce phase defects by altering the periodicity of the multi-layer. The other is for cleaning finished masks. Since the material generally used for pellicles are not transparent to EUV light, EUVL masks will not have a pellicle. The surface of such masks needs to be kept very clean, because particles on the mask are easily transferred to a wafer. This paper describes a new particle removal techniques developed at the ASET SPC Lab, called supersonic hydrocleaning . It was used to clean substrates before deposition of the multi-layer, and its effectiveness was evaluated.

Paper Details

Date Published: 19 July 2000
PDF: 8 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392046
Show Author Affiliations
Naoya Hirano, Association of Super-Advanced Electronics Technologies (Japan)
Hiromasa Hoko, Association of Super-Advanced Electronics Technologies (Japan)
Eiichi Hoshino, Association of Super-Advanced Electronics Technologies (Japan)
Taro Ogawa, Association of Super-Advanced Electronics Technologies (Japan)
Akira Chiba, Association of Super-Advanced Electronics Technologies (Japan)
Hiromasa Yamanashi, Association of Super-Advanced Electronics Technologies (Japan)
Masashi Takahashi, Association of Super-Advanced Electronics Technologies (Japan)
Shinji Okazaki, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

© SPIE. Terms of Use
Back to Top