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Proceedings Paper

Mask cleaner innovation
Author(s): Hidehiro Watanabe; Kenji Masui; Akio Kosaka; Naoya Hayamizu; Akinori Iso; Hachiro Hiratsuka; Yoshiaki Minegishi; Fumiaki Shigemitsu
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Paper Abstract

A new clustered configurational photomask cleaning system has been developed. Accepting the clustered configuration, we can be free from the heavy tank photomask cleaner which has a large footprint and has no flexibility for designing a cleaning recipe. Provided we need to introduce a new cleaning process unit, we can substitute the unit by disassembling an old one in the system. We can always keep our photomask cleaner up-to date with the system, and, we can obtain most effective cleaning result by the least efforts and the smallest expense. Using this cleaning system with an optimized cleaning recipe, we have achieved the cleaning result of less than one particle, greater than 0.2 micrometers , detected by KLA Starlight.

Paper Details

Date Published: 19 July 2000
PDF: 6 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392045
Show Author Affiliations
Hidehiro Watanabe, Toshiba Corp. (Japan)
Kenji Masui, Toshiba Corp. (Japan)
Akio Kosaka, Toshiba Corp. (Japan)
Naoya Hayamizu, Toshiba Corp. (Japan)
Akinori Iso, Shibaura Mechatronics Corp. (Japan)
Hachiro Hiratsuka, Shibaura Mechatronics Corp. (Japan)
Yoshiaki Minegishi, Clesen Co., Ltd. (Japan)
Fumiaki Shigemitsu, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

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