Share Email Print

Proceedings Paper

Impact of MEF on 0.15-um KrF lithography
Author(s): Haruo Iwasaki; Hiroyoshi Tanabe
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We studied the mask error enhancement factor (MEF) for four 0.15-micrometers patterns, isolated lines, line and space (L and S), isolated holes, and dense holes, for various process conditions. The MEF for isolated lines was the smallest of all. The MEF for L and S was not as small as that of the isolated lines. We obtained a less than 15-nm wafer critical dimension (CD) variation, when we reduced the mask CD variation to 20 nm. For the isolated-hole patterns using an attenuated phase shift mask (PSM) with large mask biasing can reduce the wafer CD variation. On the other hand, it is very difficult to reduce the MEF and the wafer CD variation for the dense-hole patterns. The alternating PSM was the best of the evaluated process, but it was not good enough to reduce the mask CD variation.

Paper Details

Date Published: 19 July 2000
PDF: 8 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392042
Show Author Affiliations
Haruo Iwasaki, NEC Corp. (Japan)
Hiroyoshi Tanabe, NEC Corp. (Japan)

Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

© SPIE. Terms of Use
Back to Top