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Proceedings Paper

In-line verification of linewidth uniformity for 0.18 and below: design rule reticles
Author(s): TaiSheng Tan; Shen Chung Kuo; Clare Wu; Reuven Falah; Shirley Hemar; Amikam Sade; Gidon Gottlib
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Paper Abstract

Mask making process development and control is addressed using a reticle inspection tool equipped with the new revolutionized application called LBM-Linewidth Bias Monitoring. In order to use the LBM for mask-making process control, procedures and corresponding test plates are a developed, such that routine monitoring of the manufacturing process discloses process variation and machine variation. At the same time systematic variation are studied and either taken care of or taken into consideration to allow successful production line work. In this paper the contribution of the LBM for mask quality monitoring is studied with respect to dense layers, e.g. DRAM. Another aspect of this application - the detection of very small CD mis-uniformity areas is discussed.

Paper Details

Date Published: 19 July 2000
PDF: 8 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392035
Show Author Affiliations
TaiSheng Tan, Taiwan Mask Corp. (Taiwan)
Shen Chung Kuo, Taiwan Mask Corp. (Taiwan)
Clare Wu, Applied Materials (Taiwan)
Reuven Falah, Applied Materials (Israel)
Shirley Hemar, Applied Materials (Israel)
Amikam Sade, Applied Materials (Israel)
Gidon Gottlib, Applied Materials (Israel)


Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

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