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Proceedings Paper

Universal inspection standard for evaluation of inspection system and algorithm sensitivity and runability
Author(s): Jerry Xiaoming Chen; Charles H. Howard; Kong Son; Franklin D. Kalk; Il-Ho Lee
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Paper Abstract

The Verimask inspection standard is widely used to qualify inspection systems due to its simplicity, ease of use in a production environment, and readily understandable defect sensitivity table. The Verimask's major drawback is that it does not characterize the runability of an inspection system. Runability refers to the system's ability to inspect various pattern types, a critical characteristic of inspection systems used for mask manufacturing. Comprehensive inspection system capability evaluation should include both sensitivity and runability tests. Other inspection test masks suffer the same shortcoming of Verimask, providing simple sensitivity analysis without runability evaluation. The Universal Inspection Standard was developed to expand the Verimask's sensitivity test and to provide a runability test. The UIS runability module contains several typical industrial feature types at multiple technology nodes. We have used UIS to evaluate and benchmark inspection system and algorithms. Future UIS versions will be available with different feature and defect types to keep pace with inspection system development. In short, UIS provides a means to quantify an inspection system's runability in addition to the traditional sensitivity evaluation.

Paper Details

Date Published: 19 July 2000
PDF: 11 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392032
Show Author Affiliations
Jerry Xiaoming Chen, DuPont Photomasks, Inc. (United States)
Charles H. Howard, DuPont Photomasks, Inc. (United States)
Kong Son, DuPont Photomasks, Inc. (United States)
Franklin D. Kalk, DuPont Photomasks, Inc. (United States)
Il-Ho Lee, DuPont Photomasks Korea Ltd. (South Korea)


Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

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