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Proceedings Paper

Quality assurance and yield improvement in photomask fabrication
Author(s): Takashi Yamauchi
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Paper Abstract

Photomask used in aspect of semiconductor is called on 'No.0 process in wafer' or 'Key-parts', so that we are required to make it with Hi-reliability and Hi-quality level. On the other hand, its problem that cost of Photomask Fabrication jumps because machine price, inspection tool, and inspection steps in leading-edge are increasing. For decreasing what we call 'cost of quality assurance', its policy is significant that quality management in photomask production line is equal quality assurance in photomask, in addition improvement process capability. This report clears the requirement of customer, specification, and the problem, introduces quality assurance and yield improvement in photomask fabrication.

Paper Details

Date Published: 19 July 2000
PDF: 3 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392029
Show Author Affiliations
Takashi Yamauchi, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

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