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Proceedings Paper

18- to 20-nm broadband multilayer at normal incidence
Author(s): Changjun Ke; Zhansan Wang; Y. Z. Ma; Jianlin Cao; Xingdan Chen
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Paper Abstract

A better random method used for improving light throughput of a soft X-ray multilayer has been developed in the 18 - 20 nm spectral region, it bases on the traditional theory of periodic multilayer, a 8% gain in integrated reflectance is obtained. We present ensemble calculation at the same time, and the multilayer is fabricated by magnetron sputtering. Finally low-angle X-ray diffraction and reflectance comparative measurement are used for testing the multilayer. The results demonstrate that layer thickness disorder yields band broadening (for both wavelength and angle) and increased integrated reflectance in the spectral range with respect to periodic multilayer, but accompanied with a reduction in reflectance peak. Layer thickness disorder makes it more difficult to fabricate broadband multilayer, raising the techniques of control layer thickness is the keystone of experiments.

Paper Details

Date Published: 18 July 2000
PDF: 5 pages
Proc. SPIE 4012, X-Ray Optics, Instruments, and Missions III, (18 July 2000); doi: 10.1117/12.391570
Show Author Affiliations
Changjun Ke, Institute of Electronics (China)
Zhansan Wang, Changchun Institute of Optics and Fine Mechanics (China)
Y. Z. Ma, Changchun Institute of Optics and Fine Mechanics (China)
Jianlin Cao, Changchun Institute of Optics and Fine Mechanics (China)
Xingdan Chen, Changchun Institute of Optics and Fine Mechanics (China)

Published in SPIE Proceedings Vol. 4012:
X-Ray Optics, Instruments, and Missions III
Joachim E. Truemper; Bernd Aschenbach, Editor(s)

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