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Proceedings Paper

Optical and thermal properties of SiNx for MO disks
Author(s): Chih-Huang Lai; Chang-Lin Huang; Chun-Yu Hsu; I-Nan Lin; JwoHuei Jou
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Paper Abstract

SiNx films were prepared by rf reactively sputtering. The refractive index of SiNx films was affected by total pressure and sputtering power. When the total pressure increased, the refractive index decreased. The reduction of sputtering power showed similar effect to raise the total gas pressure. The residual stress and roughness of SiNx films depended on the total pressure, sputtering power, and the thickness. The thermal cycles may result in irreversible change of residual stress of SiNx film. The magnetic properties of TbFeCo depended on the residual stress and roughness of SiNx in the trilayer SiNx/TbFeCo/SiNx samples. The coercivity of TbFeCo was enhanced in the samples with SiNx films having low stress and large roughness.

Paper Details

Date Published: 6 July 2000
PDF: 8 pages
Proc. SPIE 4081, Optical Storage and Optical Information Processing, (6 July 2000); doi: 10.1117/12.390516
Show Author Affiliations
Chih-Huang Lai, National Tsing Hua Univ. (Taiwan)
Chang-Lin Huang, National Tsing Hua Univ. (Taiwan)
Chun-Yu Hsu, National Tsing Hua Univ. (Taiwan)
I-Nan Lin, National Tsing Hua Univ. (Taiwan)
JwoHuei Jou, National Tsing Hua Univ. (Taiwan)


Published in SPIE Proceedings Vol. 4081:
Optical Storage and Optical Information Processing
Han-Ping D. Shieh; Tomas D. Milster, Editor(s)

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