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Proceedings Paper

Optical disk mastering an using optical superresolution effect
Author(s): ShihYaon Tsai; TsungEong Hsieh; Han-Ping D. Shieh
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Paper Abstract

We propose a new laser lithography technique using the effect of thermal-induced super resolution and demonstrate that the technique can effectively reduce the exposed spot size on the photoresist layer, thus allowing disk mastering toward higher density by using exiting light source and optics. A mask layer, whose nonlinear optical properties result in formation an aperture in high temperature area near to the center of the laser spot, is deposited on the top of the photoresist layer. Usually, the aperture size is much smaller than the laser spot, thus, achieving thermal- induced super resolution. The simulation and experimental results reveal that the line width on the photoresist layer could be shrunk by more than 40%.

Paper Details

Date Published: 6 July 2000
PDF: 8 pages
Proc. SPIE 4081, Optical Storage and Optical Information Processing, (6 July 2000); doi: 10.1117/12.390494
Show Author Affiliations
ShihYaon Tsai, National Chiao Tung Univ. (Taiwan)
TsungEong Hsieh, National Chiao Tung Univ. (Taiwan)
Han-Ping D. Shieh, National Chiao Tung Univ. (Taiwan)


Published in SPIE Proceedings Vol. 4081:
Optical Storage and Optical Information Processing
Han-Ping D. Shieh; Tomas D. Milster, Editor(s)

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