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Proceedings Paper

Laser-produced plasma-based reflectometer for EUV metrology
Author(s): Stanley Mrowka; James H. Underwood; Eric M. Gullikson; Phillip J. Batson
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Paper Abstract

An EUV/soft x-ray reflectometer is described which is based on a laser produced plasma source. Continuous wavelength scans in the range 4 nm to 40 nm are possible using a spherical grating monochromator. Focusing optics enable sub-millimeter illumination spot sizes to be achieved at the sample. Rotation and translation stages allow measurements to be made from grazing incidence to 85 degrees on samples as large as 200 mm diameter.

Paper Details

Date Published: 21 July 2000
PDF: 4 pages
Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390124
Show Author Affiliations
Stanley Mrowka, Lawrence Berkeley National Lab. (United States)
James H. Underwood, Lawrence Berkeley National Lab. (United States)
Eric M. Gullikson, Lawrence Berkeley National Lab. (United States)
Phillip J. Batson, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 3997:
Emerging Lithographic Technologies IV
Elizabeth A. Dobisz, Editor(s)

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