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Proceedings Paper

Assembly and alignment of three-aspherical-mirror optics for extreme ultraviolet projection lithography
Author(s): Katsumi Sugisaki; Tetsuya Oshino; Katsuhiko Murakami; Takeo Watanabe; Hiroo Kinoshita; Atsushi Miyafuji; Shigeo Irie; Shigeru Shirayone
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Paper Abstract

We have assembled and aligned projection optics for extreme ultraviolet (EUV) lithography. The projection optics consists of three aspherical mirrors. First, the positions of the mirrors were coarsely adjusted using the side and back surface of the mirrors. Next, the mirrors were finely aligned to minimize the wavefront errors which were measured by an interferometer. The adjustable axes were selected according to the results of the analysis of the allowable error range. The compensation values for each adjustable axis were calculated by commercially available ray-tracing software. After the alignment procedure, the wavefront error of 3 nm RMS was achieved.

Paper Details

Date Published: 21 July 2000
PDF: 8 pages
Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390114
Show Author Affiliations
Katsumi Sugisaki, Nikon Corp. (Japan)
Tetsuya Oshino, Nikon Corp. (Japan)
Katsuhiko Murakami, Nikon Corp. (Japan)
Takeo Watanabe, Himeji Institute of Technology (Japan)
Hiroo Kinoshita, Himeji Institute of Technology (Japan)
Atsushi Miyafuji, Himeji Institute of Technology (Japan)
Shigeo Irie, Association of Super-Advanced Electronics Technologies (Japan)
Shigeru Shirayone, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 3997:
Emerging Lithographic Technologies IV
Elizabeth A. Dobisz, Editor(s)

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