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Proceedings Paper

Coulomb interactions and the effect of compensating lens aberration in projection electron-beam systems
Author(s): Bo Wu; Andrew R. Neureuther
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Paper Abstract

Studies show that Coulomb interactions in the crossover region contribute significantly to the beam blur on the wafer at high beam currents. We increased the crossover size using a pair of compensating lens aberrations. Up to a 20% spot size reduction has been achieved at 20 (mu) A beam current and 1.5 mR convergence angle in simulation. We further compare interbeamlet electron interactions with intra-beamlet electron interactions in the column for different column configurations. Results also show that the stochastic blur due to Coulomb interactions from different beamlets can be combined on a root mean square basis. This result has been used to evaluate and compare the blur contribution from the stochastic interaction and space charge effect.

Paper Details

Date Published: 21 July 2000
PDF: 10 pages
Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390110
Show Author Affiliations
Bo Wu, Univ. of California/Berkeley (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)

Published in SPIE Proceedings Vol. 3997:
Emerging Lithographic Technologies IV
Elizabeth A. Dobisz, Editor(s)

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