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Proceedings Paper

New detection method for the 2-dimensional beam shape
Author(s): Yasuhiro Someda; Yasunari Sohda; Hidetoshi Satoh; Norio Saitou
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Paper Abstract

An accurate detection of the projected beam shape is the important issue in the electron beam lithography. A new detection system had been developed for obtaining the electron beam shape. The developed system consists of a transmittance mask with hole mark, an electron limiting aperture, and a faraday cup. The transmittance membrane, which has 0.2-micrometers size fine hole marks, was fabricated by double-sided etching. The limiting aperture cuts the scattered electrons that pass through the transmittance membrane. And high contrast can be obtained by the difference between the yields of the electron passing through the hole and that of electrons scattered in the transmittance membrane. Monte-Carlo simulation was performed to estimate the scattering contrast, validity of the system was thus proved. The cell projection beam, which has a 5-micrometers 2 are and a 0.2-micrometers line width, was applied for experiment. The detection contrast of the new method is 18 times higher than that of a conventional method with a dot mark. The detection resolution, which depends on the diameter of the dot or hole, was about 0.2-micrometer. We conclude that the new detection system is suitable for detecting a shaped beam such as cell projection method and electron projection lithography.

Paper Details

Date Published: 21 July 2000
PDF: 9 pages
Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390108
Show Author Affiliations
Yasuhiro Someda, Hitachi, Ltd. (Japan)
Yasunari Sohda, Hitachi, Ltd. (Japan)
Hidetoshi Satoh, Hitachi, Ltd. (Japan)
Norio Saitou, Hitachi, Ltd. (Japan)

Published in SPIE Proceedings Vol. 3997:
Emerging Lithographic Technologies IV
Elizabeth A. Dobisz, Editor(s)

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