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Proceedings Paper

Magnetron sputtered EUV mirrors with high-thermal stability
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Paper Abstract

Many applications of multilayers in the EUV spectral region require not only high normal incidence reflectivity but also high thermal stability. We instigated the thermal stability of Mo/Si multilayers in comparison with the new material combination Mo2C/Si in the temperature range from 200 degrees Celsius to 700 degrees Celsius. Additionally, we deposited and studied Mo/Si multilayers having Mo2C diffusion barriers with 0.6 nm single layer thickness. The multilayer mirrors were designed for normal incidence reflectivity at about 13 nm wavelength and were deposited by dc magnetron sputtering. X-ray scattering, transmission electron microscopy and atomic force microscopy were used for characterization of the multilayer structures. The results are correlated to the measured normal incidence reflectivity using synchrotron radiation. We achieved maximal normal incidence reflectivities of 61.8% 13.0 nm wavelength for Mo2C/Si and 59.9% 13.3 nm for Mo/Si multilayers having Mo2C diffusion barriers. While the reflectivity of Mo/Si multilayers decreased considerably after annealing above 300 degrees Celsius the Mo2C/Si multilayers showed a superior thermal stability up to 600 degrees Celsius.

Paper Details

Date Published: 21 July 2000
PDF: 11 pages
Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390079
Show Author Affiliations
Torsten Feigl, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Sergey A. Yulin, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Norbert Kaiser, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Roland Thielsch, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)


Published in SPIE Proceedings Vol. 3997:
Emerging Lithographic Technologies IV
Elizabeth A. Dobisz, Editor(s)

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