Share Email Print
cover

Proceedings Paper

Progress in Mo/Si multilayer coating technology for EUVL optics
Author(s): Eric Louis; Andrey E. Yakshin; Peter C. Goerts; Sebastian Oestreich; R. Stuik; Edward L. G. Maas; M. J. H. Kessels; Fred Bijkerk; Markus Haidl; Stefan Muellender; Michael Mertin; Detlef Schmitz; Frank Scholze; Gerhard Ulm
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Extensive optimization on the fabrication of Mo/Si multilayer systems is carried out at the FOM Institute Rijnhuizen using e-beam evaporation. The process is being optimized including parameters such as variation of the mirror's center wavelength, the metal fraction, deposition parameters, and the layer composition. Reflectivities of 69.5% are demonstrated at normal incidence, with values of 67 to 69% being routinely achieved, demonstrating the capabilities of the deposition process. Some evidence of smoothening to interface roughness values lower than the roughness of the initial substrate is given. Furthermore, investigation of the temporal behavior of the coatings does not indicate any loss of reflectivity over an eight-month period. An analysis of the multilayer composition and the interface roughness is given. The reflectivity measurements have been carried out at the PTB facilities at the electron storage rings BESSY I and BESSY II in Berlin. The results of measurements at both facilities are found to be identical and accuracy is discussed in detail.

Paper Details

Date Published: 21 July 2000
PDF: 6 pages
Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390077
Show Author Affiliations
Eric Louis, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Andrey E. Yakshin, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Peter C. Goerts, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Sebastian Oestreich, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
R. Stuik, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Edward L. G. Maas, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
M. J. H. Kessels, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Fred Bijkerk, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Markus Haidl, Carl Zeiss (Germany)
Stefan Muellender, Carl Zeiss (Germany)
Michael Mertin, Carl Zeiss (Germany)
Detlef Schmitz, Physikalisch-Technische Bundesanstalt (Germany)
Frank Scholze, Physikalisch-Technische Bundesanstalt (Germany)
Gerhard Ulm, Physikalisch-Technische Bundesanstalt (Germany)


Published in SPIE Proceedings Vol. 3997:
Emerging Lithographic Technologies IV
Elizabeth A. Dobisz, Editor(s)

© SPIE. Terms of Use
Back to Top