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Proceedings Paper

Initial benchmarking of a new electron-beam raster pattern generator for 130-100 nm maskmaking
Author(s): Charles A. Sauer; Frank E. Abboud; Sergey V. Babin; Varoujan Chakarian; Abe Ghanbari; Robert Innes; David Trost; Frederick Raymond
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Paper Abstract

The decision by the Semiconductor Industry Association (SIA) to accelerate the continuing evolution to smaller linewidths is consistent with the commitment by Etec Systems, Inc. to rapidly develop new technologies for pattern generation systems with improved resolution, critical dimension (CD) uniformity, positional accuracy, and throughput. Current pattern generation designs are inadequate to meet the more advanced requirements for masks, particularly at or below the 100 nm node. Major changes to all pattern generation tools will be essential to meet future market requirements. An electron-beam (e-beam) system that is designed to meet the challenges for 130 - 100 nm device generation with extendibility to the 70-nm range will be discussed. This system has an architecture that includes a graybeam writing strategy, a new state system, and improved thermal management. Detailed changes include a pulse width modulated blanking system, per-pixel deflection, retrograde scanning multipass writing, and a column with a 50 kV accelerating voltage that supports a dose of up to 45 (mu) C/cm2 with minimal amounts of resist heating. This paper examines current issues, our approach to meeting International Technology Roadmap for Semiconductors (ITRS) requirements, and some preliminary results from a new pattern generator.

Paper Details

Date Published: 21 July 2000
PDF: 17 pages
Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390065
Show Author Affiliations
Charles A. Sauer, Etec Systems, Inc. (United States)
Frank E. Abboud, Etec Systems, Inc. (United States)
Sergey V. Babin, Etec Systems, Inc. (United States)
Varoujan Chakarian, Etec Systems, Inc. (United States)
Abe Ghanbari, Etec Systems, Inc. (United States)
Robert Innes, Etec Systems, Inc. (United States)
David Trost, Etec Systems, Inc. (United States)
Frederick Raymond, Etec Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 3997:
Emerging Lithographic Technologies IV
Elizabeth A. Dobisz, Editor(s)

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