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Proceedings Paper

Investigation of proximity effect correction in electron projection lithography (EPL)
Author(s): Teruaki Okino; Kazuaki Suzuki; Kazuya Okamoto; Shintaro Kawata; Kiyoshi Uchikawa; Syouhei Suzuki; Sumito Shimizu; Tomoharu Fujiwara; Atsushi Yamada; Koichi Kamijo
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Paper Abstract

An electron projection lithography (EPL) system which projects reticle patterns onto a wafer will be applied to sub 100 nm lithography. Requirements for line width accuracy are very strict as feature sizes are less than 100 nm. For electron beam lithography, proximity effect corrections have always been an important issue for accurate feature width control. In this paper characteristics of several correction methods are examined, and appropriate correction methods for 100 kV EPL are introduced. Employing the shape correction method burdens the reticle pattern preparation system much more than other methods. Therefore a calculation method suitable for 100 kV EPL where the backscatter radius is very wide ((beta) b approximately equals 30 micrometer) and the forward scatter radius is narrow ((beta) f approximately equals 7 nm) has been developed. The calculation of deposition energy by the backscattered electron beam is carried out with a coarse grid but wide range. The calculation of the combined effect of the electron scattering blurs from the features is carried out only within a narrow range. The correction calculation is carried out using both of these results. Using this method, accurate and fast calculations can be achieved. Employing the GHOST correction method increases total exposure cost. The practical GHOST correction methods may also be improved. An additional correction method named shape correction with GHOST is also shown.

Paper Details

Date Published: 21 July 2000
PDF: 10 pages
Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390059
Show Author Affiliations
Teruaki Okino, Nikon Corp. (Japan)
Kazuaki Suzuki, Nikon Corp. (Japan)
Kazuya Okamoto, Nikon Corp. (Japan)
Shintaro Kawata, Nikon Corp. (Japan)
Kiyoshi Uchikawa, Nikon Corp. (Japan)
Syouhei Suzuki, Nikon Corp. (Japan)
Sumito Shimizu, Nikon Corp. (Japan)
Tomoharu Fujiwara, Nikon Corp. (Japan)
Atsushi Yamada, Nikon Corp. (Japan)
Koichi Kamijo, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 3997:
Emerging Lithographic Technologies IV
Elizabeth A. Dobisz, Editor(s)

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