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Proceedings Paper

Development of an electric capillary discharge source
Author(s): Neal R. Fornaciari; Jim J. Chang; Daniel R. Folk; Steven E. Gianoulakis; John E. M. Goldsmith; Glenn D. Kubiak; Bruce C. Long; Donna J. O'Connell; Gregory M. Shimkaveg; William T. Silfvast; Kenneth D. Stewart
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Paper Abstract

We report on the development of an electric capillary discharge source that radiates with comparable efficiency at both 13.5 nm and 11.4 nm, two wavelengths of interest for EUV lithography. The discharge source is comprised of a low- pressure, xenon-filled, small diameter capillary tube with electrodes attached to both ends. A high-voltage electric pulse applied across the capillary tube generates an intense plasma that radiates in the EUV. This source is capable of producing 7 mJ/steradian per pulse in a 0.3 nm bandwidth centered at 13.4 nm. In this paper we will address three significant issues related to the successful development of this source: minimization of debris generation, thermal management, and imaging quality.

Paper Details

Date Published: 21 July 2000
PDF: 6 pages
Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390047
Show Author Affiliations
Neal R. Fornaciari, Sandia National Labs. (United States)
Jim J. Chang, Lawrence Livermore National Lab. (United States)
Daniel R. Folk, Sandia National Labs. (United States)
Steven E. Gianoulakis, Sandia National Labs. (United States)
John E. M. Goldsmith, Sandia National Labs. (United States)
Glenn D. Kubiak, Sandia National Labs. (United States)
Bruce C. Long, Sandia National Labs. (United States)
Donna J. O'Connell, Sandia National Labs. (United States)
Gregory M. Shimkaveg, CREOL/Univ. of Central Florida (United States)
William T. Silfvast, CREOL/Univ. of Central Florida (United States)
Kenneth D. Stewart, Sandia National Labs. (United States)

Published in SPIE Proceedings Vol. 3997:
Emerging Lithographic Technologies IV
Elizabeth A. Dobisz, Editor(s)

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