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Proceedings Paper

Delineation performances of advanced 100-kV EB writer on x-ray membrane mask
Author(s): Yoshinori Nakayama; Hajime Aoyama; Shinji Tsuboi; Hiroshi Watanabe; Yukiko Kikuchi; Mizunori Ezaki; Yasuji Matsui; Tetsuo Morosawa; Kenichi Saito; Shigehisa Ohki; Tadahito Matsuda
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Paper Abstract

The keys to precision x-ray mask fabrication are the EB mask writer and the process of writing on a thin membrane. This paper concerns the delineation performance for 100 kV EB writing on x-ray membrane mask. We installed and evaluated an advanced EB mask writer, the EB-X3, which features an accelerating voltage of 100 kV and a 5-axes laser interferometer stage employing a laser measurement system with a resolution of 0.6 nm for high resolution and accuracy. The stable 100 kV EB has a good resolution around 50 nm and a beam address of 1 nm, which provide a repeatability of mark detection within 4 nm. As a result, an absolute image placement accuracy within 15 nm was obtained for 1G-bit level ULSI patterns. In addition, the combination of 100 kV EB and membrane process was found to reduce proximity effects. By several improvements including higher-order height correction and membrane process refinement, the final target of an absolute image placement error within 10 nm and a CD accuracy within 8 nm should be achieved in FY2000.

Paper Details

Date Published: 21 July 2000
PDF: 8 pages
Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390033
Show Author Affiliations
Yoshinori Nakayama, Association of Super-Advanced Electronics Technologies (Japan)
Hajime Aoyama, Association of Super-Advanced Electronics Technologies (Japan)
Shinji Tsuboi, Association of Super-Advanced Electronics Technologies (Japan)
Hiroshi Watanabe, Association of Super-Advanced Electronics Technologies (Japan)
Yukiko Kikuchi, Association of Super-Advanced Electronics Technologies (Japan)
Mizunori Ezaki, Association of Super-Advanced Electronics Technologies (Japan)
Yasuji Matsui, Association of Super-Advanced Electronics Technologies (Japan)
Tetsuo Morosawa, NTT Telecommunications Energy Labs. (Japan)
Kenichi Saito, NTT Telecommunications Energy Labs. (Japan)
Shigehisa Ohki, NTT Telecommunications Energy Labs. (Japan)
Tadahito Matsuda, NTT Telecommunications Energy Labs. (Japan)


Published in SPIE Proceedings Vol. 3997:
Emerging Lithographic Technologies IV
Elizabeth A. Dobisz, Editor(s)

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