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Proceedings Paper

Optical holography used in optical microlithography
Author(s): Boru Feng; Jin Zhang; Desheng Hou; Fen Chen
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Paper Abstract

A ne optical microlithography - optical holographic microlithography is described in the paper. The primary principle, hologram repositioning, main advantages, basic applications and some experimental system aspects of the optical holographic microlithography are also described.

Paper Details

Date Published: 5 July 2000
PDF: 6 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389082
Show Author Affiliations
Boru Feng, Institute of Optics and Electronics (China)
Jin Zhang, Institute of Optics and Electronics (China)
Desheng Hou, Institute of Optics and Electronics (China)
Fen Chen, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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