SEMICONDUCTOR3000 was the first pilot production facility for 300nm wafers in the world. This company, a joint venture between Infineon Technologies and Motorola, is working to develop a manufacturable 300mm wafer tool set. The lithography tools include I-line stepper, and two DUV scanners. These tools are used to build both 64M DRAM devices and aggressive test vehicles. This paper shows the influence of non-linear errors on 300nm wafers is much stronger than on 200mm wafers. The team determined the root causes for the stronger appearance of these effects and proposed solutions to improve the overlay performance.

Date Published: 5 July 2000
PDF: 9 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389080

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)