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Proceedings Paper

Improving image control by correcting the lens-heating focus drift
Author(s): Bwo-Jung Cheng; Hsiang-Chung Liu; Yuanting Cui; Jiyou Guo
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Paper Abstract

A robust characterization procedure of the focus drift during the lens heating effect is introduced. Through the optimized lens heating factors, we could keep the better wafer image control when exposure. Result in better critical dimension uniformity across wafer and across one field. This paper will present a detailed optimization procedure for lens heating and the benefit to fix the edge and alterative yield loss. There are several methods to characterize the total focus drift during exposure and how to keep the best focus of the image to the center of the focal plan deviation to get the more better image printing control. These methods including the image sensor scan, measurement the alignment offset of the focal mark, exposure-defocus window and CD measurement. The focus drift could be exactly compensated base on the different saturated data and keep the BF in the center of the FPD.

Paper Details

Date Published: 5 July 2000
PDF: 9 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389075
Show Author Affiliations
Bwo-Jung Cheng, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Hsiang-Chung Liu, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Yuanting Cui, WaferTech LLC (United States)
Jiyou Guo, WaferTech LLC (United States)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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