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Proceedings Paper

Deducing aerial image behavior from AIMS data
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Paper Abstract

An algorithm is proposed here that will correct aerial image intensity data taken from an MSM tool for unwanted pupil effects such as high-NA corrections or aberrations. The basis for this algorithm is the solution of a nonlinear system of equations for the unknown diffracted orders that go through the objective lens. The ultimate goal of the implementation of this algorithm is to provide a more precise picture of the behavior of the real reticle, as well as to provide proper calibration to simulation and SEM data. This algorithm is then applied to some actual MSM data in order to assess the possible aberrations in the particular MSM tool from which the data originated.

Paper Details

Date Published: 5 July 2000
PDF: 10 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389066
Show Author Affiliations
Ronald L. Gordon, Motorola (United States)
International SEMATECH (United States)
Donis G. Flagello, ASML (United States)
Martin McCallum, Motorola (United States)
International SEMATECH (United States)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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