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Proceedings Paper

Modeling the effects of excimer laser bandwidths on lithographic performance
Author(s): Armen Kroyan; Joseph J. Bendik; Olivier Semprez; Nigel R. Farrar; Christopher G. Rowan; Chris A. Mack
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Paper Abstract

In many respects, excimer lasers are almost ideal light sources for optical lithography applications. Their narrow bandwidth and high power provide tow of the main characteristics required of a light source for high- resolution imaging. However, for deep-UV lithography projection tools with no chromatic aberration in the imaging lens, even the very narrow bandwidth of an excimer laser may lead to image degradation.

Paper Details

Date Published: 5 July 2000
PDF: 7 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389057
Show Author Affiliations
Armen Kroyan, Cymer, Inc. (United States)
Joseph J. Bendik, Cymer, Inc. (United States)
Olivier Semprez, Cymer, Inc. (United States)
Nigel R. Farrar, Cymer, Inc. (United States)
Christopher G. Rowan, Cymer, Inc. (United States)
Chris A. Mack, FINLE Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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