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Proceedings Paper

Scalable pattern generator data path: for the future
Author(s): Charlotta Johansson; Lars Ivansen; Anders Thuren; Per Liden; Mans Bjuggren
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Paper Abstract

With the shrinking design rules for semiconductors mask data complexity increases continuously. The increasing use of OPC, which has become common for advanced masks, reinforces this trend. The requirements on data processing increase and make it a possible bottleneck. Increasing write times directly impact the cost of the photomask. These facts raise the question of how to design a data path that will not limit the writing speed and throughput of a pattern generator.

Paper Details

Date Published: 5 July 2000
PDF: 8 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389055
Show Author Affiliations
Charlotta Johansson, Micronic Laser Systems AB (Sweden)
Lars Ivansen, Micronic Laser Systems AB (Sweden)
Anders Thuren, Micronic Laser Systems AB (Sweden)
Per Liden, Micronic Laser Systems AB (Sweden)
Mans Bjuggren, Micronic Laser Systems AB (Sweden)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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