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Proceedings Paper

Aberration averaging using point spread function for scanning projection systems
Author(s): Hiroshi Ooki; Tomoya Noda; Koichi Matsumoto
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Paper Abstract

Scanning projection system plays a leading part in current DUV optical lithography. It is frequently pointed out that the mechanically induced distortion and field curvature degrade image quality after scanning. On the other hand, the aberration of the projection lens is averaged along the scanning direction. This averaging effect reduces the residual aberration significantly. The aberration averaging based on the point spread function and phase retrieval technique in order to estimate the effective wavefront aberration after scanning is described in this paper. Our averaging method is tested using specified wavefront aberration, and its accuracy is discussed based on the measured wavefront aberration of recent Nikon projection lens.

Paper Details

Date Published: 5 July 2000
PDF: 8 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389044
Show Author Affiliations
Hiroshi Ooki, Nikon Corp. (Japan)
Tomoya Noda, Nikon Corp. (Japan)
Koichi Matsumoto, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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