Share Email Print
cover

Proceedings Paper

Long-term testing of optical components for 157-nm lithography
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Photolithography utilizing 157-nm excimer lasers is a leading candidate technology for the post-193-nm generation. A key element required for successful insertion of this technology is the near-term performance and long-term reliability of the components of the optical train, including transparent bulk materials for lenses, optical coatings, photomask substrates, and pellicles. For instance, after 100 billion pulses at an incident fluence of 0.5 mJ/cm2/pulse optical materials, of which the primary candidate is calcium fluoride, should have an absorption coefficient of less than 0.002 cm-1, and antireflective layers should enable transmission of 98.5 percent for a two-sided coated substrate. Modified fused silica has emerged as a viable option as a transparent photomask substrate, and several approaches are being explored for transmissive membranes to be used as pellicles.

Paper Details

Date Published: 5 July 2000
PDF: 8 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389037
Show Author Affiliations
Vladimir Liberman, MIT Lincoln Lab. (United States)
Mordechai Rothschild, MIT Lincoln Lab. (United States)
Jan H. C. Sedlacek, MIT Lincoln Lab. (United States)
Ray S. Uttaro, MIT Lincoln Lab. (United States)
Allen Keith Bates, IBM Corp. (United States)
International SEMATECH (United States)
Kevin J. Orvek, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

© SPIE. Terms of Use
Back to Top