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Proceedings Paper

Experimentation and modeling of organic photocontamination on lithographic optics
Author(s): Roderick R. Kunz; Vladimir Liberman; Deanna K. Downs
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Paper Abstract

Photodeposition of organic films on transparent substrates irradiated in the presence of trace levels of hydrocarbons has been experimentally investigated and a model is presented that describes the film growth behavior. The efficacy of a given organic precursor at forming a deposit is proportional to the product of its surface coverage and by its photon absorption cross section. These measurement are important in predicting the transmission characteristics of lithographic optics operating at 157-, 193-, and 248-nm wavelength. For example, a lens element irradiated continuously for one year in the presence of 1 part per billion of t-butyl benzene would exhibit a transmission of approximately 87 percent at 193 nm. The effects of oxygen- containing ambients are also documented, and methods for elimination and/or prevention of organic contamination are suggested.

Paper Details

Date Published: 5 July 2000
PDF: 14 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389036
Show Author Affiliations
Roderick R. Kunz, MIT Lincoln Lab. (United States)
Vladimir Liberman, MIT Lincoln Lab. (United States)
Deanna K. Downs, MIT Lincoln Lab. (United States)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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