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Proceedings Paper

Measurement of lens aberration by using in-situ interferometer and classification of lens for correct application
Author(s): Nakgeuon Seong; Gisung Yeo; Hanku Cho; Joo-Tae Moon
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Paper Abstract

Lens aberration has been a kind of nuisance for lithographers. As feature size is getting smaller, aberration caused malfunction is getting more important and should be considered for correct use of lens. Therefore, the accurate lens aberration measurements are needed to predict patterning characteristics of critical layer of a device at given lens and to decide whether the lens is usable for the device or not. In this paper, in-situ interferometer is used for aberration measurement and measured aberrations were compared with phase measurement interferometer data for accuracy evaluation. Finally, printed patterns and simulated results were compared. As a practical application of measured aberration, classification of lens for a given device was performed.

Paper Details

Date Published: 5 July 2000
PDF: 10 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389032
Show Author Affiliations
Nakgeuon Seong, Samsung Electronics Co., Ltd. (South Korea)
Gisung Yeo, Samsung Electronics Co., Ltd. (South Korea)
Hanku Cho, Samsung Electronics Co., Ltd. (South Korea)
Joo-Tae Moon, Samsung Electronics Co., Ltd. (South Korea)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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