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Proceedings Paper

Phase-mask effects by dark-field lithography
Author(s): Donald L. White; Raymond A. Cirelli; Steven J. Spector; Myrtle I. Blakey; Obert R. Wood II
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Paper Abstract

A new resolution enhancement technique for photolithography that makes use of dark-field (DF) illumination was recently reported. In a DF projector, light from the condenser illuminates the reticle at such a steep angle that zero order light is lost from the system. The mask for a DF projector contains a series of sub-resolution gratings that diffract light into the lens and define features so be printed on the wafer. These sub-resolution gratings can be employed to precisely control the amplitude, phase and direction of light diffracted from each point on the mask. Given such precise control, many effect is can be produced with DF lithography that are not possible with enhanced optical lithography, e.g., terminating lines and resolving phase conflicts.

Paper Details

Date Published: 5 July 2000
PDF: 7 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389026
Show Author Affiliations
Donald L. White, Lucent Technologies/Bell Labs. (United States)
Raymond A. Cirelli, Lucent Technologies/Bell Labs. (United States)
Steven J. Spector, Lucent Technologies/Bell Labs. (United States)
Myrtle I. Blakey, Lucent Technologies/Bell Labs. (United States)
Obert R. Wood II, Lucent Technologies/Bell Labs. (United States)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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