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Proceedings Paper

Understanding lens aberration and influences to lithographic imaging
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Paper Abstract

Lithographic imaging in the presence of lens aberration result sin unique effects, depending on feature type, size, phase, illumination, and pupil use. As higher demands are placed on optical lithography tools, a better understanding of the influence of lens aberration is required. The goal of this paper is to develop some fundamental relationships and to address issues regarding the importance, influence, and interdependence of imaging parameters and aberration.

Paper Details

Date Published: 5 July 2000
PDF: 13 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389018
Show Author Affiliations
Bruce W. Smith, Rochester Institute of Technology (United States)
Ralph E. Schlief, Rochester Institute of Technology (United States)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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