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Proceedings Paper

High-density lithography using attenuated phase-shift mask and negative resist
Author(s): Stanley Pau; Raymond A. Cirelli; Kevin J. Bolan; Allen G. Timko; John Frackoviak; Pat G. Watson; Lee E. Trimble; James W. Blatchford; Omkaram Nalamasu
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Paper Abstract

We demonstrate a technique to print. high-density windows using attenuated phase shift mask, negative photoresist and ArF exposure tool and compare our result with that obtained using a binary mask and positive photoresists.

Paper Details

Date Published: 5 July 2000
PDF: 5 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389015
Show Author Affiliations
Stanley Pau, Lucent Technologies/Bell Labs. (United States)
Raymond A. Cirelli, Lucent Technologies/Bell Labs. (United States)
Kevin J. Bolan, Lucent Technologies/Bell Labs. (United States)
Allen G. Timko, Lucent Technologies/Bell Labs. (United States)
John Frackoviak, Lucent Technologies/Bell Labs. (United States)
Pat G. Watson, Lucent Technologies/Bell Labs. (United States)
Lee E. Trimble, Lucent Technologies/Bell Labs. (United States)
Lucent Technologies (United States)
James W. Blatchford, Lucent Technologies (United States)
Omkaram Nalamasu, Lucent Technologies/Bell Labs. (United States)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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